The Factors Determining the Rate of Anodic Dissolution of Ferrosilicon Alloys

Issue 1(83) 2017
Pages 23-31

I.R. Gellershtein, SEZAR COMPANY GROUP
Y.S. Tolypin, SEZAR COMPANY GROUP
S.A. Parshin, Magnit Ltd
M.V. Tarasevich, Magnit Ltd
V.V. Ibragimova, Magnit Ltd
M.S. Lipkin, South Russian Polytechnical University
M.A. Gavrilova, Don State Agricuturial University
Yu.N. Nikolaeva, South Russian Polytechnical University
A.A. Postnikov, South Russian Polytechnical University
N.V. Tarasova, Lipetsk State Technical University


Keywords: ferrosilicon electrodes, phase composition, fraction of free-surface, the rate of anodic dissolution, pulse chronopotentiometry, clamping design sensor

The dissolution rate of ferrosilicon alloys depends on a combination of properties of passivation films formed on the surface. The minimum dissolution rate corresponds to the low-porosity films composed of silicon oxide or the formation of underfilm alloy layer enriched with alloying components.