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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">corrosionprotection</journal-id><journal-title-group><journal-title xml:lang="ru">Практика противокоррозионной защиты</journal-title><trans-title-group xml:lang="en"><trans-title>Theory and Practice of Corrosion Protection</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1998-5738</issn><issn pub-type="epub">2658-6797</issn><publisher><publisher-name>Association "CARTEC"</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.31615/j.corros.prot.2026.120.2-1</article-id><article-id custom-type="elpub" pub-id-type="custom">corrosionprotection-210</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>ПРИКЛАДНАЯ ЭЛЕКТРОХИМИЯ</subject></subj-group></article-categories><title-group><article-title>Влияние продолжительности эксплуатации сернокислого электролита меднения на структуру и термомеханическую устойчивость медных покрытий сквозных отверстий малого диаметра</article-title><trans-title-group xml:lang="en"><trans-title>Effect of Sulfuric Acid Copper Plating Electrolyte Operation Duration on the Structure and Thermomechanical Stability of Through Holes Small Diameter Copper Coatings</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Васильев</surname><given-names>А. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Vasilev</surname><given-names>Aleksei S.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Васильев Алексей Сергеевич, аспирант, </p><p>125047, г. Москва, Миусская площадь, д. 9.</p></bio><bio xml:lang="en"><p>Aleksei S. Vasilev, Postgraduate, </p><p>9, Miusskaya square, Moscow, 125047.</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Калинкина</surname><given-names>А. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Kalinkina</surname><given-names>Anna A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Калинкина Анна Анатольевна, к.х.н., доцент, </p><p>125047, г. Москва, Миусская площадь, д. 9.</p></bio><bio xml:lang="en"><p>Anna A. Kalinkina, Cand. Sci. in Chemistry, Associate Professor, </p><p>9, Miusskaya square, Moscow, 125047.</p></bio><email xlink:type="simple">aakalinkina@mail.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Красникова</surname><given-names>А. П.</given-names></name><name name-style="western" xml:lang="en"><surname>Krasnikova</surname><given-names>Alena P.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Красникова Алёна Петровна, студент, </p><p>125047, г. Москва, Миусская площадь, д. 9.</p></bio><bio xml:lang="en"><p>Alena P. Krasnikova, Student, </p><p>9, Miusskaya square, Moscow, 125047.</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Ваграмян</surname><given-names>Т. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Vagramyan</surname><given-names>Tigran A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Ваграмян Тигран Ашотович, д.т.н., профессор, заведующий кафедрой, </p><p>125047, г. Москва, Миусская площадь, д. 9.</p></bio><bio xml:lang="en"><p>Tigran A. Vagramyan, Dr. Sci. in Technic, Professor, Head of Department,</p><p>9, Miusskaya square, Moscow, 125047.</p></bio><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Российский химико-технологический университет имени Д.И. Менделеева</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Dmitry Mendeleev University of Chemical Тесhпоlоgy of Russia</institution><country>Russian Federation</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2026</year></pub-date><pub-date pub-type="epub"><day>20</day><month>06</month><year>2026</year></pub-date><volume>31</volume><issue>2</issue><fpage>6</fpage><lpage>17</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Васильев А.С., Калинкина А.А., Красникова А.П., Ваграмян Т.А., 2026</copyright-statement><copyright-year>2026</copyright-year><copyright-holder xml:lang="ru">Васильев А.С., Калинкина А.А., Красникова А.П., Ваграмян Т.А.</copyright-holder><copyright-holder xml:lang="en">Vasilev A.S., Kalinkina A.A., Krasnikova A.P., Vagramyan T.A.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://www.corrosion-protection.ru/jour/article/view/210">https://www.corrosion-protection.ru/jour/article/view/210</self-uri><abstract><p>В работе изучено влияние продолжительности эксплуатации сернокислого электролита меднения на структуру и устойчивость гальванических медных покрытий сквозных отверстий к термоудару. Электроосаждение в высокочастотном реверсном режиме с прямоугольными импульсами тока в присутствии комплексной добавки позволяет обеспечить равномерное распределение меди в сквозных отверстиях. В начале эксплуатации электролита для медных покрытий наблюдается плоская текстура кристаллизации с преобладанием атомных плоскостей [<xref ref-type="bibr" rid="cit220">220</xref>], охарактеризованная методом рентгеновской дифрактометрии. По мере эксплуатации электролита проявляется и становится преимущественной кристаллографическая ориентация [<xref ref-type="bibr" rid="cit111">111</xref>] электроосажденной меди, в результате увеличивается шероховатость поверхности покрытий. Поскольку содержание меди в электролите в процессе электролиза, по данным рентгеновской флуоресцентной спектроскопии, практически не изменялось, наблюдаемые изменения текстуры могут быть связаны с расходованием блескообразующего компонента ингибирующей добавки. Это предположение подтверждено методом циклической вольтамперометрии. По мере снижения концентрации блескообразующего компонента в процессе эксплуатации снижается устойчивость медных покрытий сквозных отверстий к термоудару. </p></abstract><trans-abstract xml:lang="en"><p>The copper sulfate electrolyte operation duration effect on the structure and stability of through holes electroplated copper coatings thermal shock is studied. Electrodeposition in a high-frequency reverse mode with rectangular current pulses in the presence of a complex additive makes it possible to ensure uniform distribution of copper in through holes. At the beginning of the copper coatings electrolyte operation a flat crystallization texture with a predominance of atomic planes [<xref ref-type="bibr" rid="cit220">220</xref>] is observed, it characterized by X-ray diffractometry. As the electrolyte is used, the crystallographic orientation [<xref ref-type="bibr" rid="cit111">111</xref>] of the electrodeposited copper appears and becomes predominant, resulting in an increase in the surface roughness of the coatings. Since the copper content in the electrolyte remained virtually unchanged during electrolysis according to X-ray fluorescence spectroscopy, the observed texture changes may be related to the consumption of the inhibitory additive gloss-forming component. This assumption is confirmed by cyclic voltammetry. As the concentration of the gloss-forming component decreases during operation, the through holes copper coatings thermal shock resistance decreases.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>электроосаждение меди</kwd><kwd>сквозные отверстия</kwd><kwd>структура</kwd><kwd>распределение меди</kwd><kwd>реверсирование тока</kwd><kwd>морфология</kwd><kwd>шероховатость</kwd><kwd>пластичность</kwd><kwd>термоудар</kwd></kwd-group><kwd-group xml:lang="en"><kwd>copper electrodeposition</kwd><kwd>through holes</kwd><kwd>structure</kwd><kwd>copper distribution</kwd><kwd>current reversal</kwd><kwd>morphology</kwd><kwd>roughness</kwd><kwd>plasticity</kwd><kwd>thermal shock</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Медведев А. М. 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