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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">corrosionprotection</journal-id><journal-title-group><journal-title xml:lang="ru">Практика противокоррозионной защиты</journal-title><trans-title-group xml:lang="en"><trans-title>Theory and Practice of Corrosion Protection</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1998-5738</issn><issn pub-type="epub">2658-6797</issn><publisher><publisher-name>Association "CARTEC"</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.31615/j.corros.prot.2026.120.2-3</article-id><article-id custom-type="elpub" pub-id-type="custom">corrosionprotection-212</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>ПРИКЛАДНАЯ ЭЛЕКТРОХИМИЯ</subject></subj-group></article-categories><title-group><article-title>Исследование влияния тиомочевины и тринатриевой соли нитрилотриуксусной кислоты в растворах иммерсионного серебрения медных контактных площадок печатных плат на процесс осаждения и структуру покрытий</article-title><trans-title-group xml:lang="en"><trans-title>Study of the Influence of Thiourea and Trisodium Nitrilotriacetic Acid in Immersion Silver Plating Solutions for Copper Contact Pads of Printed Circuit Boards on the Structure of Coatings</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Желудкова</surname><given-names>Е. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Zheludkova</surname><given-names>Ekaterina A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Желудкова Екатерина Александровна, к.т.н., доцент, </p><p>125047, Москва, Миусская площадь, д. 9.</p></bio><bio xml:lang="en"><p>Ekaterina A. Zheludkova, Cand. Sci. in Technic, Associate Professor, </p><p>9, Miusskaya square, Moscow, 125047.</p></bio><email xlink:type="simple">zheludkovvva.e.a@muctr.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Ницук</surname><given-names>Д. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Nitsuk</surname><given-names>Daria A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Ницук Дарья Алексеевна, студент, </p><p>125047, Москва, Миусская площадь, д. 9.</p></bio><bio xml:lang="en"><p>Daria A. Nitsuk, Student, </p><p>9, Miusskaya square, Moscow, 125047.</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Аснис</surname><given-names>Н. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Asnis</surname><given-names>Naum A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Аснис Наум Аронович, к.т.н., ведущий инженер,</p><p>125047, Москва, Миусская площадь, д. 9.</p></bio><bio xml:lang="en"><p>Naum A. Asnis, Cand. Sci. in Technic, Leading Engineer, </p><p>9, Miusskaya square, Moscow, 125047.</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Абрашов</surname><given-names>А. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Abrashov</surname><given-names>Alexey A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Абрашов Алексей Александрович, к.т.н., доцент,</p><p>125047, Москва, Миусская площадь, д. 9.</p></bio><bio xml:lang="en"><p>Alexey A. Abrashov, Cand. Sci. in Technic, Associate Professor, </p><p>9, Miusskaya square, Moscow, 125047.</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Григорян</surname><given-names>Н. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Grigoryan</surname><given-names>Nelya S.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Григорян Неля Сетраковна, к.т.н., профессор,</p><p>125047, Москва, Миусская площадь, д. 9.</p></bio><bio xml:lang="en"><p>Nelya S. Grigoryan, Cand. Sci. in Technic, Professor, </p><p>9, Miusskaya square, Moscow, 125047.</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Ваграмян</surname><given-names>Т. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Vagramyan</surname><given-names>Tigran A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Ваграмян Тигран Ашотович, д.т.н., профессор, зав. кафедрой,</p><p>125047, Москва, Миусская площадь, д. 9.</p></bio><bio xml:lang="en"><p>Tigran A. Vagramyan, Doctor Sci. in Technic, Professor, Head of Department,</p><p>9, Miusskaya square, Moscow, 125047.</p></bio><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Российский химико-технологический университет имени Д.И. Менделеева</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Dmitry Mendeleev University of Chemical Тесhпоlоgy of Russia</institution><country>Russian Federation</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2026</year></pub-date><pub-date pub-type="epub"><day>20</day><month>06</month><year>2026</year></pub-date><volume>31</volume><issue>2</issue><fpage>33</fpage><lpage>45</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Желудкова Е.А., Ницук Д.А., Аснис Н.А., Абрашов А.А., Григорян Н.С., Ваграмян Т.А., 2026</copyright-statement><copyright-year>2026</copyright-year><copyright-holder xml:lang="ru">Желудкова Е.А., Ницук Д.А., Аснис Н.А., Абрашов А.А., Григорян Н.С., Ваграмян Т.А.</copyright-holder><copyright-holder xml:lang="en">Zheludkova E.A., Nitsuk D.A., Asnis N.A., Abrashov A.A., Grigoryan N.S., Vagramyan T.A.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://www.corrosion-protection.ru/jour/article/view/212">https://www.corrosion-protection.ru/jour/article/view/212</self-uri><abstract><p>В статье представлены результаты комплексного исследования процесса иммерсионного серебрения медной поверхности. Основное внимание уделено изучению влияния концентрации лигандов на кинетику процесса осаждения и электрохимические характеристики системы. Объектом исследования выступили тринатриевая соль нитрилотриуксусной кислоты и тиомочевина в различных соотношениях с ионами серебра. В ходе работы была проведена оптимизация технологических параметров процесса осаждения. В статье представлен сравнительный анализ структуры формируемых из исследуемых растворов покрытий, их толщины и сплошности. Результаты исследования могут быть использованы при разработке технологических процессов нанесения серебряных покрытий в электронной промышленности, производстве электронных приборов и радиотехнической отрасли.</p></abstract><trans-abstract xml:lang="en"><p>The article presents the results of a comprehensive study of the immersion silvering process of copper surfaces. The main focus is on studying the effect of ligand concentration on the kinetics of the deposition process and the electrochemical characteristics of the system. The objects of the research were trisodium salt of nitrilotriacetic acid and thiourea in various ratios with silver ions. During the work, the optimization of technological parameters of the deposition process was successfully carried out. The article presents a comparative analysis of the structure of coatings formed from the studied solutions, their thickness, and continuity. The results of the research can be used in the development of technological processes for applying silver coatings in the electronics industry, electronic device manufacturing, and the radio engineering sector.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>печатные платы</kwd><kwd>финишные покрытия</kwd><kwd>иммерсионное серебрение</kwd><kwd>лиганд</kwd><kwd>обработка поверхности</kwd></kwd-group><kwd-group xml:lang="en"><kwd>printed circuit boards</kwd><kwd>finish coatings</kwd><kwd>immersion silvering</kwd><kwd>ligand</kwd><kwd>surface treatment</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Костенников Д., Сержантов А., Шкундина С. Современный финишный процесс иммерсионного серебрения YMT GALAXY // Технологии в электронной промышленности. − 2018. − № 5. − С. 29-31.</mixed-citation><mixed-citation xml:lang="en">Kostennikov, D., Serzhantov, A. &amp; Shkundina, S. 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