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Effect of Sulfuric Acid Copper Plating Electrolyte Operation Duration on the Structure and Thermomechanical Stability of Through Holes Small Diameter Copper Coatings

https://doi.org/10.31615/j.corros.prot.2026.120.2-1

Abstract

The copper sulfate electrolyte operation duration effect on the structure and stability of through holes electroplated copper coatings thermal shock is studied. Electrodeposition in a high-frequency reverse mode with rectangular current pulses in the presence of a complex additive makes it possible to ensure uniform distribution of copper in through holes. At the beginning of the copper coatings electrolyte operation a flat crystallization texture with a predominance of atomic planes [220] is observed, it characterized by X-ray diffractometry. As the electrolyte is used, the crystallographic orientation [111] of the electrodeposited copper appears and becomes predominant, resulting in an increase in the surface roughness of the coatings. Since the copper content in the electrolyte remained virtually unchanged during electrolysis according to X-ray fluorescence spectroscopy, the observed texture changes may be related to the consumption of the inhibitory additive gloss-forming component. This assumption is confirmed by cyclic voltammetry. As the concentration of the gloss-forming component decreases during operation, the through holes copper coatings thermal shock resistance decreases.

About the Authors

Aleksei S. Vasilev
Dmitry Mendeleev University of Chemical Тесhпоlоgy of Russia
Russian Federation

Aleksei S. Vasilev, Postgraduate, 

9, Miusskaya square, Moscow, 125047.



Anna A. Kalinkina
Dmitry Mendeleev University of Chemical Тесhпоlоgy of Russia
Russian Federation

Anna A. Kalinkina, Cand. Sci. in Chemistry, Associate Professor, 

9, Miusskaya square, Moscow, 125047.



Alena P. Krasnikova
Dmitry Mendeleev University of Chemical Тесhпоlоgy of Russia
Russian Federation

Alena P. Krasnikova, Student, 

9, Miusskaya square, Moscow, 125047.



Tigran A. Vagramyan
Dmitry Mendeleev University of Chemical Тесhпоlоgy of Russia
Russian Federation

Tigran A. Vagramyan, Dr. Sci. in Technic, Professor, Head of Department,

9, Miusskaya square, Moscow, 125047.



References

1. Medvedev, A. M. (2013). Study of thermostable metal-composite compounds in multilayer circuit boards. Konstrukcii iz kompozicionnyh materialov, (4), 45-48. (in Russ.)

2. Kosarev, A. A., Kalinkina, A. A., Kruglikov, S. S., Vagramyan, T. A. & Kasatkin, V. E. (2021). Effect of the macro-and microthrowing power of the electrolyte on the uniformity of distribution of electroplated copper in through-holes for PCB. Journal of Solid State Electrochemistry, 25(5), 1491-1501. https://doi.org/10.1007/s10008021-04922-0

3. Kalinkina, A. A., Vasiliev, A. S., Krasnikova, A.P., Shcherbakov, V. V. & Vagramyan, T. A. (2022). The impact of current reversal in the presence of inhibitory additives on the thermomechanical stability of galvanic copper coatings. International Journal of Corrosion and Scale Inhibition, 11(3), 1214-1227. https://doi.org/10.17675/2305-6894-202211-3-18

4. Aleshina, V. K., Grigoryan, N. S., Asnis, N. A., Vagramyan, T. A. & Kuznetsova, T. I. (2021). Additives to the electrolyte for copper plating of through-holes in multilayer printedcircuit boards. International Journal of Corrosion and Scale Inhibition, 10(4), 1661-1676. https://doi.org/10.17675/2305-6894-2021-10-4-18

5. Tereshkin, V. A. et al. (2020). Electrochemical copper plating of precision printed circuit board with the thickness to hole diameter ratio of 15:1. Tekhnologii v electronnoj promyshlennosti, (8), 8-15. (in Russ.)

6. Ge, W., Li, W., Li, R., Dong, Y., Zeng, Z. & Cao, H. (2022). Ultra-uniform copper deposition in high aspect ratio plated through holes via pulse-reverse plating. Coatings, 12(7), 995. https://doi.org/10.3390/coatings12070995

7. Chen, T. C., Tsai, Y. L., Hsu, C. F., Dow, W. P. & Hashimoto, Y. (2016). Effects of brighteners in a copper plating bath on throwing power and thermal reliability of plated through holes. Electrochimica Acta, 212, 572-582. https://doi.org/10.1016/j.electacta.2016.07.007

8. Zheng, L., He, W., Zhu, K., Wang, C., Wang, S. & Hong, Y. (2018). Investigation of poly (1-vinyl imidazole co 1, 4-butanediol diglycidyl ether) as a leveler for copper electroplating of through-hole. Electrochimica Acta, 283, 560-567. https://doi.org/10.1016/j.electacta.2018.06.132

9. Xiang, J., Wang, S., Li, J., He, W., Wang, C. & Chen, Y. (2018). Electrochemical factors of levelers on plating uniformity of throughholes: simulation and experiments. Journal of the electrochemical society, 165(9), E359. https://doi.org/10.1149/2.0331809jes

10. Huang, B. C., Yang, C. H., Lee, C. Y., Hu, Y. L., Hsu, C. C. & Ho, C. E. (2019). Effect of pulse-reverse plating on copper: Thermal mechanical properties and microstructure relationship. Microelectronics reliability, 96, 7177. https://doi.org/10.1016/j.microrel.2019.04.004

11. Chandrasekar, M. S., Pushpavanam, M. (2008). Pulse and pulse reverse plating− Conceptual, advantages and applications. Electrochimica Acta, 53(8), 3313-3322. https://doi.org/10.1016/j.electacta.2007.11.054

12. Rudajevová, A., Dušek, K. (2018). Influence of manufacturing mechanical and thermal histories on dimensional stabilities of FR4 laminate and FR4/Cu-plated holes. Materials, 11, 2114. https://doi.org/10.3390/ma11112114

13. Gamburg, Y.D. (1997). Electrochemical Crystallization of Metals and Alloys. Moscow: Yanus-К. (in Russ.)

14. Täubert, C. E., Kolb, D. M., Memmert, U. & Meyer, H. (2007). Adsorption of the additives MPA, MPSA, and SPS onto Cu (111) from sulfuric acid solutions. Journal of The Electrochemical Society, 154(6), D293. https://doi.org/10.1149/1.2719611

15. Gorelyuk, S. S et al. (2002). X-ray, electron and optic analysis. Moscow: Metallurgiya. (in Russ.)

16. Matulis, J. (1969). Bright electrolytic coatings. Vilnius: Publishing house “MINTIS”. (in Russ.)


Review

For citations:


Vasilev A.S., Kalinkina A.A., Krasnikova A.P., Vagramyan T.A. Effect of Sulfuric Acid Copper Plating Electrolyte Operation Duration on the Structure and Thermomechanical Stability of Through Holes Small Diameter Copper Coatings. Theory and Practice of Corrosion Protection. 2026;31(2):6-17. (In Russ.) https://doi.org/10.31615/j.corros.prot.2026.120.2-1

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ISSN 1998-5738 (Print)
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